Source multiplexing in lithography

Details Source multiplexing in lithography Source multiplexing in lithography

2006-02-21

2006-02-21

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S493100, C250S494100, C353S037000, C353S099000

Reexamination Certificate

active

07002164

ABSTRACT:
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

REFERENCES:
patent: 6399935 (2002-06-01), Jovin et al.
patent: 6426506 (2002-07-01), Hudyma
patent: 6479830 (2002-11-01), Fornaca et al.
patent: 6570168 (2003-05-01), Schultz et al.

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