Soft vacuum electron beam patterning apparatus and process

Details Soft vacuum electron beam patterning apparatus and process Soft vacuum electron beam patterning apparatus and process

1986-04-28

1989-05-02

Church, Craig E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01V 3730

Patent

active

048271373

ABSTRACT:
A cold cathode glow discharge electron gun operating in the abnormal glow region produces a wide area collimated electron beam employed for flood exposure of thin film materials through electron beam transmission masks, resulting in spatially localized exposure and patterning of the thin film materials.

REFERENCES:
patent: 4119688 (1978-10-01), Hiraoka
patent: 4321470 (1982-03-01), Kaplan et al.
patent: 4366383 (1982-12-01), Sano et al.
patent: 4496449 (1985-01-01), Rocca et al.
"Glow Discharge", McGraw-Hill Encyclopedia of Science and Technology, 6th Edition, 1987, vol. 8, pp. 137-138.

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