Stabilizing support mechanism for electron beam apparatus

Details Stabilizing support mechanism for electron beam apparatus Stabilizing support mechanism for electron beam apparatus

1996-03-04

1997-07-01

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044211, G01B 902

Patent

active

056441371

ABSTRACT:
An electron beam apparatus is provided with a support mechanism upon which X and Y axis interferometers are mounted within a vacuum chamber. By employing a flat ring of a low coefficient of thermal expansion glass ceramic composition affixed beneath the chamber upper wall and to which the interferometers are mounted, the normal extremes of vacuum and heat as existing within the chamber are resisted to insure of a fixed horizontal alignment of the beams as projected by the interferometers during operation of the apparatus. Flexure mounts are included for the interferometer ring together with a magnetic shield disposed adjacent the ring undersurface. Stability of workpieces is further enhanced by the use of the same glass ceramic composition in the formation of the carrier and its reference plate of the apparatus.

REFERENCES:
patent: 4818838 (1989-04-01), Young et al.
patent: 4891526 (1990-01-01), Reeds

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