Retainer ring for securing substrates in a vacuum deposition sys

Details Retainer ring for securing substrates in a vacuum deposition sys Retainer ring for securing substrates in a vacuum deposition sys

1980-12-10

1982-08-17

Smith, John D.

Coating apparatus

Gas or vapor deposition

Work support

118503, 292299, B05C 1302

Patent

active

043443834

ABSTRACT:
A novel wafer retainer assembly is described which includes a ring member for securing wafers in a planetary fixture. The ring member is easily removed or inserted by means of thumb and forefinger pressure exerted on tabs extending from open ends of a resilient spring and maintains the wafers in apertures on the planet member without exerting any pressure on the wafers, thus avoiding breakage.

REFERENCES:
patent: 1207937 (1916-12-01), Kruse
patent: 3138173 (1964-06-01), Hartman
patent: 3768440 (1973-10-01), Doman et al.
patent: 3850138 (1974-11-01), Patono

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