Coating apparatus – Gas or vapor deposition – Work support
Patent
1998-06-17
2000-05-02
Aftergut, Jeff H.
Coating apparatus
Gas or vapor deposition
Work support
118728, 118729, 269 21, C23C 1600
Patent
active
060568259
ABSTRACT:
In a chuck (1) for disk-like objects (silicon wafers), there are several ting devices with respect to surface (4) of chuck (1) that faces toward the object, where the lifting devices are designed as, e.g., pegs (2) that are run out vertically with respect to surface (4) of chuck (1) that faces toward the object and can be retracted back into surface (4). By means of pegs (2), the distance between the object and chuck (1) can be increased in order to mount objects on chuck (1) and remove them therefrom, so that, especially when silicon wafers are handled, the spoon-like devices that are used to place these wafers onto receiving trays and remove them therefrom can also be used.
REFERENCES:
patent: 4903717 (1990-02-01), Sumnitsch
patent: 5071485 (1991-12-01), Matthews et al.
patent: 5447570 (1995-09-01), Schmitz et al.
patent: 5452905 (1995-09-01), Bohmer et al.
patent: 5492566 (1996-02-01), Sumnitsch
patent: 5513668 (1996-05-01), Sumnitsch
patent: 5553994 (1996-09-01), Biche et al.
patent: 5626675 (1997-05-01), Sakamoto et al.
patent: 5695568 (1997-12-01), Sinha et al.
patent: 5762391 (1998-06-01), Sumnitsch
patent: 5848670 (1998-12-01), Salzman
Aftergut Jeff H.
SEZ Semiconductor-Equipment Zubehor fur die Halbleiterfertigung
LandOfFree
Rotary chuck including pins for lifting wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Rotary chuck including pins for lifting wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotary chuck including pins for lifting wafers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1591213