Reflector apparatus for chemical vapor deposition reactors

Details Reflector apparatus for chemical vapor deposition reactors Reflector apparatus for chemical vapor deposition reactors

1987-05-12

1989-04-25

Pianalto, Bernard

Coating apparatus

Gas or vapor deposition

Work support

118 64, 118620, 118641, 118728, C23C 1600

Patent

active

048237353

ABSTRACT:
A reflector apparatus with multiple reflecting facets for chemical vapor deposition reactors. For vertical and barrel reactors, the facets are annular and fit around the bell-jar shaped process enclosure. The facets may be adjusted by orienting or curving the reflecting facet surfaces so that the radiant energy from the reactor susceptor may be reflected back to the susceptor and wafers as desired for uniform heating of the processed semiconductor wafers.

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