Heat treated and sintered sputtering target

Details Heat treated and sintered sputtering target Heat treated and sintered sputtering target

1997-10-08

1999-03-16

Phipps, Margery

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

148430, 148513, 148514, 75228, 75247, 419 33, C23C 1414, B41M 526

Patent

active

058824936

ABSTRACT:
A sputtering target, for forming a recording layer of an optical recording medium in which information is written and erased through a transition between two phases by utilizing electromagnetic wave energy, consists of a heat-treated and sintered composition represented by the formula:

REFERENCES:
patent: 3530441 (1970-09-01), Ovshinsky et al.
patent: 5100700 (1992-03-01), Ide et al.
patent: 5156693 (1992-10-01), Ide et al.

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