High frequency plasma source

Details High frequency plasma source High frequency plasma source

2005-08-30

2005-08-30

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298040, C204S298080, C204S298160, C118S7230IR, C156S345400, C156S345420, C422S186000, C422S186040, C422S186290

Reexamination Certificate

active

06936144

ABSTRACT:
A high frequency plasma source includes a support element, on which a magnetic field coil arrangement, a gas distribution system and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network is arranged within the plasma source.

REFERENCES:
patent: 4948259 (1990-08-01), Enke et al.
patent: 4994711 (1991-02-01), Matossian
patent: 5858477 (1999-01-01), Veerasamy et al.
patent: 0 597 497 (1994-05-01), None
patent: 03095843 (1991-04-01), None
patent: WO 99/44219 (1999-09-01), None

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