High magnetic flux permanent magnet array apparatus and method f

Details High magnetic flux permanent magnet array apparatus and method f High magnetic flux permanent magnet array apparatus and method f

1996-07-10

1998-05-05

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1435

Patent

active

057468974

ABSTRACT:
A high magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition includes a magnetron array with a plurality of magnet assemblies disposed proximate to a target. Each assembly comprises a first portion magnetized perpendicularly to the target, a second portion magnetized perpendicularly to the target and opposite the first portion, and a third portion positioned intermediate the first and second portions, the third portion magnetized parallel to the target.

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