Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2007-03-06
2007-03-06
Turner, Archene (Department: 1775)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S279000, C204S280000, C204S298120, C264S910000
Reexamination Certificate
active
11109726
ABSTRACT:
A hard film for cutting tools which is composed ofin-line-formulae description="In-line Formulae" end="lead"?(Ti1−a−b−c−d, Ala, Crb, Sic, Bd)(C1−eNe)in-line-formulae description="In-line Formulae" end="tail"?0.5≦a≦0.8, 0.06≦b, 0≦c≦0.1, 0≦d≦0.1,0≦c+d≦0.1, a+b+c+d<1, 0.5≦e≦1(where a, b, c, and d denote respectively the atomic ratios of Al, Cr, Si, and B, and e denotes the atomic ratio of N).
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Hanaguri Koji
Morikawa Yasuomi
Satou Toshiki
Takahara Kazuki
Yamamoto Kenji
Kabushiki Kaisha Kobe Seiko Sho
Turner Archene
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