Film forming apparatus

Details Film forming apparatus Film forming apparatus

1994-05-27

1997-10-07

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429815, 414217, 414222, 118719, 118728, C23C 1400, B65G 4905

Patent

active

056743688

ABSTRACT:
A film forming apparatus includes a film forming chamber in which a film is formed on a substrate at a film forming position, a plurality of load lock chambers provided on the film forming chamber through gate valves respectively, a plurality of pivots provided in the film forming chamber correspondingly to the respective load lock chambers, and carrying arms supported by the pivots respectively so as to move the substrate from any one of the load lock chambers to the film forming position and contrariwise from the film forming position to any one of the load lock chambers.

REFERENCES:
patent: 4297484 (1981-10-01), Mitomi
patent: 4388034 (1983-06-01), Takahashi
patent: 4595483 (1986-06-01), Mahler
patent: 4820106 (1989-04-01), Walde et al.
patent: 4857160 (1989-08-01), Landau et al.
patent: 4886592 (1989-12-01), Anderle et al.
patent: 5019233 (1991-05-01), Blake et al.
patent: 5061356 (1991-10-01), Tanaka et al.
patent: 5180718 (1993-01-01), Tepman et al.
patent: 5186594 (1993-02-01), Toshima et al.
patent: 5217501 (1993-06-01), Fuse et al.
patent: 5223001 (1993-06-01), Saeki
patent: 5344542 (1994-09-01), Mahler et al.
patent: 5417537 (1995-05-01), Miller
patent: 5435682 (1995-07-01), Crabb et al.

Affiliated with

Also associated with

Rating

Film forming apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film forming apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film forming apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2353851