Ferromagnetic high speed sputtering apparatus

Details Ferromagnetic high speed sputtering apparatus Ferromagnetic high speed sputtering apparatus

1982-03-25

1983-08-30

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192M, C23C 1500

Patent

active

044015461

ABSTRACT:
A ferromagnetic, high-speed sputtering apparatus including an evacuable chamber, a substrate in the chamber, a target of ferromagnetic substance in the chamber facing the substrate, and magnetic field developing means in the chamber on the side of the target opposite the substrate. The target serves as a cathode. The target includes at least two separate segments of ferromagnetic substance which are spaced apart one from another by a gap so that a leakage magnetic field may be produced on the surface of the target facing the substrate. The gap may be less than about 3 mm. Each of the segments can include a ridge portion on the surface facing the substrate. Each ridge portion can have at least one apex and at least one slant surface.

REFERENCES:
patent: 3501393 (1970-03-01), Wehner et al.
patent: 4049857 (1977-09-01), Hammer
patent: 4158589 (1979-06-01), Keller et al.
patent: 4162954 (1979-07-01), Morrison
patent: 4180450 (1979-12-01), Morrison
patent: 4198283 (1980-04-01), Class et al.
patent: 4200510 (1980-04-01), O'Connell
patent: 4239611 (1980-12-01), Morrison
patent: 4299678 (1981-11-01), Meckel
Chapin, The Planar Magnetism, Vacuum Technology, Technical Publishing Company, Research, Development, Jan. 1974, pp. 37-40.
Vorous, Planar Magnetron Sputtering, A New Industrial Coating Technique, Vac-Tec Systems, Boulder, Colorado, pp. 62-66.

Affiliated with

Also associated with

Rating

Ferromagnetic high speed sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ferromagnetic high speed sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ferromagnetic high speed sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-904999