Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-09-10
1992-09-22
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429811, 20429816, C23C 1434
Patent
active
051494159
ABSTRACT:
Herein disclosed is a film forming apparatus, in which a magnet for generng the lines of magnetic force generally at a right angle with respect to opposed cathodes is disposed at one of the cathodes to shorten the distance from a passage hole through a conduit to an object by the thickness of the magnet, thereby to pass metal particles efficiently. At the same time, a holed plate is supported elastically and in close contact with the object to form a film contouring the shape of the hole of the holed plate correctly. Moreover, the holed plate is made thinner than its diameter to permit sufficient passage of the metal particles through the hole of the holed plate thereby to form a film efficiently. In the film forming apparatus of the present invention, moreover, the magnet of the vacuum chamber at the side of the conduit of the prior art can be dispensed with to make unnecessary the drilling of the magnet and to reduce the number of parts.
Koseki Osamu
Sugita Toshio
Adams Bruce L.
Department of Electrical Engineering, Science University of Toky
Nguyen Nam
Seiko Instruments Inc.
Wilks Van C.
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