Film forming apparatus

Details Film forming apparatus Film forming apparatus

1990-10-03

1991-12-24

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429816, 118723, C23C 1434, C23C 1600

Patent

active

050749854

ABSTRACT:
A film forming apparatus comprises of a microwave generating device and processing chamber. The processing chamber has a substrate therein, holds the pressure of atmosphere gas therein at a predetermined value, and generates plasma while introducing the microwave generated by the microwave generating device for forming a film on the substrate. The microwave is introduced in the processing chamber through a dielectric member disposed in the processing chamber. Further a shielding member is disposed in the processing chamber so as to be opposite to the dielectric member for preventing the attachment of film forming material to the dielectric member.

REFERENCES:
patent: 4721553 (1988-01-01), Saito et al.
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 4857809 (1989-08-01), Torri et al.
patent: 4952273 (1990-08-01), Popov
patent: 4970435 (1990-11-01), Tanaka et al.

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