Ferromagnetic high speed sputtering apparatus

Details Ferromagnetic high speed sputtering apparatus Ferromagnetic high speed sputtering apparatus

1982-07-23

1983-11-01

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044129076

ABSTRACT:
A ferromagnetic, high speed, sputtering apparatus is provided which comprises a vacuum chamber and a target of ferromagnetic material. The target comprises at least two segments which are positioned adjacent to one another and have a gap therebetween. This gap has at least a portion of which that does not extend in the direction of the thickness of the target. A substrate in the vacuum chamber is positioned facing one side of the target. Also, magnetic field generating means is positioned on the other side of the target so that the magnetic field therefrom leaks through the gap.

REFERENCES:
patent: 4158589 (1979-06-01), Keller
patent: 4162954 (1979-07-01), Morrison
patent: 4180450 (1979-12-01), Morrison
patent: 4198283 (1980-04-01), Class et al.
patent: 4239611 (1980-12-01), Morrison
patent: 4265729 (1981-05-01), Morrison

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