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Continuous dry etching system

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Continuous enzymatic reactor

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Continuous flow electrophoresis apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Continuous preparative electrophoresis apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Continuous sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Continuous vacuum processing apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Contoured sputtering target

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Control of erosion profile and process characteristics in...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Controlling apparatus for continuous electrolytic ion water prod

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooled backing plate for a sputtering target, and sputtering...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooled microscope slide and electrode apparatus for use in live

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooling device for a sputter target and source

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooling method and apparatus for magnetron sputtering

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooling system for a slab gel electrophoresis apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cooling system for magnetron sputtering apparatus

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Copper sputtering target assembly and method of making same

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Copper sputtering target assembly and method of making same

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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CoPt-base sputtering target, method of making same, magnetic...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cover for coating tanks

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Cover ring and shield supporting a wafer ring in a plasma...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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