Cooling method and apparatus for magnetron sputtering

Details Cooling method and apparatus for magnetron sputtering Cooling method and apparatus for magnetron sputtering

1990-12-21

1992-12-15

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

2042982, C23C 1435

Patent

active

051714159

ABSTRACT:
The movable magnet track housing of a magnetron sputtering apparatus is provided with a cooling channel and a plurality of nozzles for cooling the backing plate of the magnetron sputtering target. A cooling liquid is delivered to the cooling channel, which distributes the pressure of the liquid to its nozzles. Fluid dispensed from the nozzles is directed at a given area on the back of the target backing plate to make cooling more efficient. The flattened teardrop shape of the magnet track is suitable for achieving uniform magnetic flux in an annular region when rotated about a predetermined center of rotation. The magnet track is rotated circularly and moved radially during magnetron sputtering to achieve substantially uniform magnetic flux over a major annular region of the target, while suitably eroding the center and perimeter regions of the target.

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patent: 4826584 (1989-05-01), dos Santos Pereiro Ribeiro

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