Continuous sputtering apparatus

Details Continuous sputtering apparatus Continuous sputtering apparatus

1984-08-30

1987-06-23

Niebling, John F.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20419232, C23C 1436

Patent

active

046750967

ABSTRACT:
A continuous sputtering apparatus comprising a main vacuum chamber, one loading station and a plurality of process stations capable of having their pressures controlled separately. The process station includes a sub vacuum chamber capable of being in communication with the main vacuum chamber through an opening and an evacuation port. The loading station and the process stations are arranged to be spaced with equal angles. Substrate holders are provided to face the stations and are rotated by said equal angle in a time. The substrate holder opens and closes the opening of the sub vacuum chamber to serve as a gate valve.

REFERENCES:
patent: 3981791 (1976-09-01), Rosvold
patent: 4274936 (1981-06-01), Love
patent: 4311427 (1982-01-01), Coad et al.
patent: 4379743 (1983-04-01), Nakatsukasa et al.
patent: 4405435 (1983-09-01), Tateishi et al.

Affiliated with

Also associated with

Rating

Continuous sputtering apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous sputtering apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous sputtering apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-719572