4. Active solid-state devices (e.g., transistors, solid-state diode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for fabrication thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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CMOS image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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