Interconnect structure using a combination of hard dielectric an

Interconnect structure using Al.sub.2 -Cu for an integrated circ

Interconnect structure with a dielectric layer conforming to...

Interconnect structure with air gap compatible with unlanded...

Interconnect structure with an enlarged air gaps disposed...

Interconnect structure with an integrated low density dielectric

Interconnect structure with hard mask and low dielectric constan

Interconnect structure with precise conductor resistance and...

Interconnect structures and a method of electroless...

Interconnect structures and methods for their fabrication

Interconnect structures containing stress adjustment cap layer

Interconnect structures for integrated circuits

Interconnect structures for integrated circuits

Interconnect structures having tantalum/tantalum oxide layers

Interconnect structures incorporating low-k dielectric...

Interconnect structures using group VIII metals

Interconnect structures with patternable low-k dielectrics...

Interconnect substrate, semiconductor device, methods of...

Interconnect wiring with sidewalls and inter-wiring...

Interconnect with composite layers and method for...