Reduction of mobile ion and metal contamination in HDP-CVD chamb
Reduction of n-channel parasitic transistor leakage by using low
Reduction of native oxide at germanium interface using...
Reduction of negative bias temperature instability in narrow...
Reduction of negative bias temperature instability using...
Reduction of noise, and optimization of magnetic field...
Reduction of ONO fence during self-aligned etch to eliminate pol
Reduction of orientation dependent oxidation for vertical...
Reduction of package height in a stacked die configuration
Reduction of pad erosion
Reduction of particle deposition on substrates using temperature
Reduction of plasma charge-induced damage in microfabricated...
Reduction of plasma damage at contact etch in MOS integrated...
Reduction of plasma damage for HDP-CVD PSG process
Reduction of poly depletion in semiconductor integrated circuits
Reduction of polysilicon contact resistance by nitrogen implanta
Reduction of punch-thru defects in damascene processing
Reduction of reverse short channel effects by deep...
Reduction of semiconductor structure damage during reactive ion
Reduction of sheet resistance of phosphorus implanted...