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Copper damascene manufacturing process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Copper damascene technology for ultra large scale...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Copper damascene with low-k capping layer and improved...

Semiconductor device manufacturing: process – Silicon carbide semiconductor
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Copper dendrite prevention by chemical removal of dielectric

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper deposition for filling features in manufacture of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper diffusion barrier

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper diffusion barrier, aluminum wetting layer and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Copper electrodeposition in microelectronics

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Copper electroless deposition on a titanium-containing surface

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper electromigration inhibition by copper alloy formation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper etch using HCI and HBr chemistry

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Copper etch using HCl and HBR chemistry

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Copper film selective formation method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper gate electrode of liquid crystal display device and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Charge transfer device
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Copper interconnect by immersion/electroless plating in dual...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper interconnect methodology for enhanced electromigration re

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent

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Copper interconnect patterning

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Copper interconnect structure and method of formation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper interconnect structure having stuffed diffusion barrier

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Copper interconnect structure having stuffed diffusion barrier

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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