Copper gate electrode of liquid crystal display device and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Charge transfer device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S148000, C438S152000, C438S586000, C438S632000, C257SE21134, C257SE21279, C257SE21347, C257SE21413, C257SE21703, C257SE29278, C257SE29282

Reexamination Certificate

active

07829393

ABSTRACT:
A copper gate electrode, applied in a thin-film-transistor liquid crystal display (LCD) device, at least comprises a patterned copper layer formed on a glass substrate, and a barrier layer formed on the patterned copper layer. The barrier layer comprises at least one of nitrogen and phosphorus, or comprises an alloy formularized as M1M2R wherein M1is cobalt (Co) or molybdenum (Mo), M2is tungsten (W), molybdenum (Mo), rhenium (Re) or vanadium (V), and R is boron (B) or phosphorus (P).

REFERENCES:
patent: 5695810 (1997-12-01), Dubin et al.
patent: 6794220 (2004-09-01), Hirai et al.
patent: 6802985 (2004-10-01), Chikama et al.
patent: 7279777 (2007-10-01), Bai et al.
patent: 7323368 (2008-01-01), Takayama et al.
patent: 2003/0038594 (2003-02-01), Seo et al.
patent: 2003/0162412 (2003-08-01), Chung
patent: 2003/0233960 (2003-12-01), Grunwald
patent: 2004/0125257 (2004-07-01), Chae et al.
patent: 2006/0060834 (2006-03-01), Hirai
patent: 08-248442 (1996-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Copper gate electrode of liquid crystal display device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Copper gate electrode of liquid crystal display device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copper gate electrode of liquid crystal display device and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4243303

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.