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Minimizing transistor size in integrated circuits

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Minimum size integrated circuit static memory cell

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Mirror image memory cell transistor pairs featuring poly...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS semiconductor device and manufacturing method thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS semiconductor device and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS semiconductor device and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device having an LDD structure and a manufactu

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device having an LDD structure and a...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS semiconductor device having an LDD structure and a...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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MIS transistor and method for making same on a semiconductor...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS transistor and method for producing same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS transistors with a metal gate and high-k dielectric and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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MIS type semiconductor device and method for manufacturing same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Mitigation of CMP-induced BPSG surface damage by an integrated a

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Mitigation of edge degradation in ferroelectric memory...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Mixed metal nitride and boride barrier layers

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Mixed mode process

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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