Activation of CMOS source/drain extensions by ultra-high...

Amorphizing ion implant method for forming polysilicon...

Angled implant to improve high current operation of bipolar...

Bipolar device having improved capacitance

Bipolar junction transistor with improved extrinsic base...

Bipolar thin-film transistors and method for forming

Bipolar transistor device having phosphorous

Bipolar transistor with L-shaped base-emitter spacer

Bipolar transistor with ultra small self-aligned polysilicon...

Capacitor structure for a logic process

Charge breakdown avoidance for MIM elements in SOI base...

Circuit and method for reducing parasitic bipolar effects...

Control of amount and uniformity of oxidation at the...

Deep N wells in triple well structures and method for...

Dielectric apparatus and associated methods

Diffused extrinsic base and method for fabrication

Dopant precursors and ion implantation processes

Double-spacer technique for forming a bipolar transistor with a

Dual laser anneal for graded halo profile

Fabrication of abrupt ultra-shallow junctions