Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Self-aligned
Reexamination Certificate
2006-09-13
2010-02-23
Wilczewski, M. (Department: 2822)
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Self-aligned
C257SE21537
Reexamination Certificate
active
07666750
ABSTRACT:
The invention, in one aspect, provides a semiconductor device that comprises a collector located in a semiconductor substrate and an isolation region located under the collector, wherein a peak dopant concentration of the isolation region is separated from a peak dopant concentration of the collector by at least about 0.9 microns. The invention also provides a method for forming this device.
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Chen Alan S.
Dyson Mark
Kerr Daniel C.
Rossi Nace M.
Agere Systems Inc.
Wilczewski M.
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