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Method and structures for dual depth oxygen layers in...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Method and system for monocrystalline epitaxial deposition

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Method and system for providing a continuous motion...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method and system for providing a single-scan, continuous...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method and system for providing a smaller critical dimension...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation
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Method and system for providing a smaller critical dimension...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation
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Method and system for reducing charge damage in...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Method for annealing silicon thin films and polycrystalline...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Method for automated electromigration verification

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Method for blocking dislocation propagation of semiconductor

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Method for calculating a time-related fill level signal

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation
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Method for co-fabricating strained and relaxed crystalline...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Method for coating a semiconductor substrate with a mixture...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth step with preceding and subsequent diverse...
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Method for controlling deposition parameters based on...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Method for crystallizing amorphous silicon

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method for crystallizing amorphous silicon film

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method for crystallizing amorphous silicon layer

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Method for crystallizing silicon

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method for depositing a film on a substrate using Cat-PACVD

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Method for depositing high-quality microcrystalline...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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