Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Reexamination Certificate
2011-05-17
2011-05-17
Garber, Charles (Department: 2812)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
On insulating substrate or layer
C438S029000, C438S046000, C438S082000, C438S478000, C438S483000, C257SE21125, C257SE21158, C257SE21318
Reexamination Certificate
active
07943494
ABSTRACT:
The present invention provides a method for blocking the dislocation propagation of a semiconductor. A semiconductor layer is formed by epitaxial process on a substrate. A plurality of recesses is formed on the semiconductor layer by etching fragile locations of the semiconductor layer where dislocation occurs. Thereafter, a blocking layer is formed on each of the plurality of recesses. The aforesaid semiconductor layer undergoes epitaxial process again on the aforesaid semiconductor layer, and laterally overgrows to redirect the dislocation defects.
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Chan Shih Hsiung
Huang Shih Cheng
Lin Wen Yu
Tu Po Min
Wu Peng Yi
Advanced Optoelectronic Technology Inc.
Ahmadi Mohsen
Chew Raymond J.
Garber Charles
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