Method and system for providing a smaller critical dimension...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21092

Reexamination Certificate

active

07419891

ABSTRACT:
The method and system for providing a magnetic element are disclosed. The method and system include providing a magnetic element stack that includes a plurality of layers and depositing a stop layer on the magnetic element stack. The method and system also include providing a dielectric antireflective coating (DARC) layer on the stop layer, forming a single layer mask for defining the magnetic element on a portion of the DARC layer, and removing a remaining portion of the DARC layer not covered by the single layer mask. The portion of the DARC layer covers a portion of the stop layer. The method further includes removing a remaining portion of the stop layer and defining the magnetic element using at least the portion of stop layer as a mask.

REFERENCES:
patent: 5471555 (1995-11-01), Braga et al.
patent: 6669983 (2003-12-01), Kagami et al.
patent: 6683759 (2004-01-01), Chang et al.
patent: 6687098 (2004-02-01), Huai
patent: 6760200 (2004-07-01), Hasegawa
patent: 6876527 (2005-04-01), Gill
patent: 2001/0000445 (2001-04-01), Shiroishi
patent: 2004/0021024 (2004-02-01), Yoshimura et al.
patent: 2004/0264240 (2004-12-01), Hineman et al.
patent: 2005/0191764 (2005-09-01), Yates et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for providing a smaller critical dimension... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for providing a smaller critical dimension..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for providing a smaller critical dimension... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3972444

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.