Method and system for providing a smaller critical dimension...

Details Method and system for providing a smaller critical dimension... Method and system for providing a smaller critical dimension...

2006-02-13

2008-09-02

Malsawma, Lex (Department: 2892)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

Plural fluid growth steps with intervening diverse operation

C257SE21092

Reexamination Certificate

active

07419891

ABSTRACT:
The method and system for providing a magnetic element are disclosed. The method and system include providing a magnetic element stack that includes a plurality of layers and depositing a stop layer on the magnetic element stack. The method and system also include providing a dielectric antireflective coating (DARC) layer on the stop layer, forming a single layer mask for defining the magnetic element on a portion of the DARC layer, and removing a remaining portion of the DARC layer not covered by the single layer mask. The portion of the DARC layer covers a portion of the stop layer. The method further includes removing a remaining portion of the stop layer and defining the magnetic element using at least the portion of stop layer as a mask.

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