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SOI chip with mesa isolation and recess resistant regions

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI device and method of isolation thereof

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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SOI device with different silicon thicknesses

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI LDMOS structure with improved switching characteristics

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Field plate electrode
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SOI semiconductor configuration and method of fabricating...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI semiconductor device having gettering layer and method...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – And gettering of substrate
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SOI structure with a deep thin oxide layer prepared by ION impla

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate and a method for fabricating the same

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate and fabrication process therefor

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate and manufacturing method thereof

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate and method of producing the same

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate and process for preparing the same, and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate processing method

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate, semiconductor substrate, and method for...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI substrate, semiconductor substrate, and method for...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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SOI wafers with 30-100 Å buried oxide (BOX) created by...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation
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Solar cell fabrication using extrusion mask

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
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Source bus formation for a flash memory using silicide

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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SPIMOX/SIMOX combination with ITOX option

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Implanting to form insulator
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Spin coating for maximum fill characteristic yielding a...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
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