LandOfFree - US Patents - Listing for Semiconductor device manufacturing: process,Formation of electrically isolated lateral semiconductive...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High aspect ratio high density plasma (HDP) oxide gapfill...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High aspect ratio trench isolation process for surface...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature

High contrast, low noise alignment mark for laser trimming of re

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High density isolation using an implant as a polish stop

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High density trench fill due to new spacer fill method...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive...

High performance semiconductor devices fabricated with...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High performance strained CMOS devices

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having air-gap dielectric

High permeability layered films to reduce noise in high...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Isolation by pn junction only

High Q inductor integration

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High quality isolation for high density and high performance int

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive...

High quality isolation structure formation

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High resistivity silicon wafer with thick epitaxial layer...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation

High temperature local oxidation of silicon for fine line patter

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High temperature sensors utilizing doping controlled,...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

High throughput chemical vapor deposition process capable of fil

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High voltage integrated switching devices on a bonded and...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-frequency line

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-frequency wireless communication system on a single ultrath

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Total dielectric isolation

High-quality SGOI by annealing near the alloy melting point