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Dual damascene wiring and method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual damascene with bond pads

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Dual damascene with silicon carbide middle etch stop layer/ARC

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual damascene with via liner

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual hardmask single damascene integration scheme in an...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual in-laid integrated circuit structure with selectively posit

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual inlaid process using an imaging layer to protect via...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer barrier film techniques to prevent resist poisoning

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer barrier film techniques to prevent resist poisoning

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer barrier film techniques to prevent resist poisoning

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer bottom anti-reflective coating

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer nickel deposition using a cobalt barrier to...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer photoresist method for fabricating a mushroom...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual layer silicide formation using a titanium barrier to...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual level contacts and method for forming

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual liner capping layer interconnect structure and method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual material gate MOSFET technique

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual metal gate process: metals and their silicides

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual metal gate self-aligned integration

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual metal gate transistors for CMOS process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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