Radially oscillating carousel processing system for chemical mec

Ready-to-use stable chemical-mechanical polishing slurries

Real-time control of chemical-mechanical polishing...

Reduced pad erosion

Reducing CMP scratch, dishing and erosion by post CMP etch...

Reduction of surface roughness during chemical mechanical...

Reduction of surface roughness during chemical mechanical...

Reduction of tungsten damascene residue

Removal chemistry for selectively etching metal hard mask

Removal of CMP and post-CMP residue from semiconductors...

Removal of CMP residue from semiconductor substrate using...

Removal of CMP residue from semiconductors using...

Removal of polishing residue from substrate using...

Removal of wafer edge defocus due to CMP

Removal rate behavior of spin-on dielectrics with chemical mecha

Resist removal by polishing

Reverse linear chemical mechanical polisher with loadable...

Reverse linear polisher with loadable housing

Reverse lithographic process for semiconductor vias

Reverse tone mask method for post-CMP elimination of copper...