Exposure apparatus

Details Exposure apparatus Exposure apparatus

1994-03-08

1995-12-12

Rosenberger, Richard A.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

355 68, G01B 1100, G03B 2774

Patent

active

054754917

ABSTRACT:
An exposure apparatus includes a supplying portion for supplying a radiation beam; a detector; an optical arrangement operable to amplitude-divide the radiation beam from the supplying portion to produce first and second beams, the optical arrangement being effective to direct the first beam to a workpiece to expose the same with the first beam and also to direct the second beam to the detector to cause the same to produce a signal; wherein the optical arrangement is arranged so that, independently of a change in the state of polarization of the radiation beam, the signal from the detector is substantially proportional to the intensity of the first beam.

REFERENCES:
patent: 4711568 (1987-12-01), Torigoe et al.
patent: 4779943 (1988-10-01), Tatsuno et al.

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