Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1993-07-23
1995-09-05
Pham, Hoa Q.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356381, 33707, G01B 1102
Patent
active
054483611
ABSTRACT:
An electro-optical micrometer for measuring the thickness of a workpiece includes a fixture for holding the workpiece in a fixed position and a plunger that can be moved from a reference position to a second position indicative of the thickness of the workpiece. The plunger carries a spherical convex lens. A laser directs a beam of light against the lens and thereafter onto a sensor that can determine the linear displacement of the beam of light. The movement of the plunger can be correlated to linear displacements of the beam of light which, in turn, can be calculated and displayed by a computer.
REFERENCES:
patent: 455644 (1891-07-01), Sloane
patent: 1875665 (1932-09-01), Schweizer
patent: 2441317 (1948-05-01), Gribble
patent: 2549566 (1951-04-01), Bentley et al.
patent: 2604004 (1952-07-01), Root, III
patent: 2773311 (1956-12-01), Kettler
patent: 2820298 (1958-01-01), Bendt
patent: 3046666 (1962-07-01), Mesich
patent: 4103427 (1978-08-01), Ledley, III
patent: 4419824 (1983-12-01), Oberhans
patent: 4459749 (1984-07-01), Rieder et al.
patent: 4678948 (1987-07-01), Schmitt
patent: 4736313 (1988-04-01), Nishimura
patent: 4798469 (1989-01-01), Burke
patent: 4922307 (1990-05-01), Schaffer
patent: 5231469 (1993-07-01), Jeffers et al.
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