Exposure apparatus with thickness and defect detection

Details Exposure apparatus with thickness and defect detection Exposure apparatus with thickness and defect detection

1996-10-30

1998-03-10

Font, Frank G.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356237, 2505594, 25055927, G01B 1106, G01N 2100

Patent

active

057267561

ABSTRACT:
An optical disk master exposure apparatus employs first laser light modulated in accordance with signals to be recorded is irradiated on a resist layer to expose the resist layer in patterns corresponding to the signals to be recorded, and second laser light having a wavelength which is not sensed by the resist layer is irradiated on a predetermined surface of a predetermined member. The thickness of the resist layer is measured based on a change in output amount of the second laser light emitted by a light source, the output light amount of which is controlled so as to maintain a constant amount of second reflected light produced by irradiating the second laser light on the predetermined surface of the predetermined member. Also, the predetermined surface of the predetermined member is tested for possible defects existing thereon based on a change in amount of the second reflected light. In this way, a layer thickness test and a defect test can be conducted during an exposure stage, thereby making it possible to integrate the layer thickness testing stage, the defect testing stage, and the exposure stage into a single stage and accordingly realize an exposure apparatus which is capable of simply performing a mastering procedure at a low cost.

REFERENCES:
patent: 4500615 (1985-02-01), Iwai

Affiliated with

Also associated with

Rating

Exposure apparatus with thickness and defect detection does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus with thickness and defect detection, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus with thickness and defect detection will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-143624