LandOfFree - US Patents - Listing for Etching a substrate: processes

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma etching of silicon using fluorinated gas mixtures

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Plasma etching using polycarbonate mask and low pressure-high de

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Plasma etching using polycarbonate mask and low-pressure...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma generating apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Plasma generation and control using a dual frequency RF source

Etching a substrate: processes – Heating or baking of substrate prior to etching to change...

Plasma heating of a substrate with subsequent high...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation

Plasma method for stripping ion implanted photoresist layers

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma process for etching multicomponent alloys

Etching a substrate: processes – Forming groove or hole in a substrate which is subsequently...

Plasma process for selectively etching oxide using...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and a plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Plasma processing apparatus and control method thereof

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate

Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and method with controlled...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate

Plasma processing apparatus and plasma processing method