Halogen-free amorphous carbon mask etch having high...
Hard mask integrated etch process for patterning of silicon...
Hard masking method for forming oxygen containing plasma etchabl
Hard masking method for forming patterned oxygen containing plas
Hard masking method for forming patterned oxygen containing...
Head member, method for ink-repellent treatment and...
Head slider with projecting arranged on rails thereof
Heat treatment jig for semiconductor wafers and a method for tre
Heat-transfer-stamp process for thermal imprint lithography
Heater for use in electrophotographic image fixing device
Heating element
Hermetic low dielectric constant layer for barrier applications
HF vapor phase wafer cleaning and oxide etching
High aspect ratio contacts
High aspect ratio etch using modulation of RF powers of...
High density plasma chemical vapor deposition process
High density plasma chemical vapor deposition process
High etch rate residue free metal etch process with low frequenc
High frequency plasma process wherein the plasma is executed by
High precision alignment of optical waveguide features