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Formation of nanoscale wires

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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Hard mask integrated etch process for patterning of silicon...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
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Imprint method, imprint apparatus, and process for producing...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
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In-situ oxidized textured surfaces for prosthetic devices...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Integrated post-etch treatment for a dielectric etch process

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Intermediate layer lithography

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Magnetically patterned etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
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Manufacturing method of fine structure, optical element,...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Manufacturing method of light-guiding apparatus for using in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
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Mask for the selective growth of a solid, a manufacturing...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Metal mask etching of silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
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Metal substrate for a magnetic disc and manufacture thereof

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
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Method and apparatus for heat-treating substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method and apparatus for retaining an internal coating...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is reusable
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Method and compositions for hardening photoresist in etching...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
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Method and devices for preventing restenosis in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method and etchant to join ag-clad BSSCO superconducting tape

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Adhesively bonding resist to substrate
Patent

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Method and system for line-dimension control of an etch process

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for etching PT film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for fabricating nano-sized diamond whisker, and...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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