Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate
2006-10-11
2010-11-09
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Mechanically forming pattern into a resist
C216S041000, C430S300000
Reexamination Certificate
active
07828984
ABSTRACT:
An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure.
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Seki Jun-ichi
Suehira Nobuhito
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Vinh Lan
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