Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
Patent
1994-03-01
1997-01-14
Dang, Thi
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
Resist material applied in particulate form or spray
216 22, 216 49, 216 50, 216100, C23F 100
Patent
active
055936024
ABSTRACT:
The present invention provides a process for producing a metal substrate for a thin film magnetic data storage disc, the process including the steps of: (a) providing a metal substrate; (b) printing a masking pattern onto at least a portion of the surface of the substrate; and (c) etching the unmasked surface of the substrate thereby to texture the substrate surface. The present invention also provides a metal substrate for a thin film magnetic data storage disc, the substrate having a roughened surface produced by preferential area etching, the roughened surface being composed of a regular pattern of peaks separated by valleys.
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Bradshaw John M.
Gelder Richard
Dang Thi
Pilkington plc
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