Active neural network control of wafer attributes in a plasma et

Active neural network determination of endpoint in a plasma etch

Active species control with time-modulated plasma

Adjustable dc bias control in a plasma reactor

Adjusting DC bias voltage in plasma chambers

Anisotropic dry etching of Cu-containing layers

Anisotropic etching method and apparatus

Anisotropic etching method and apparatus

Anisotropic nitride etch process with high selectivity to...

Aperture fill

Apparatus and method for controlling the voltage applied to...

Apparatus and method for detecting end point of post treatment

Apparatus and method for electrostatically shielding an...

Apparatus and method for enhancing the uniform etching...

Apparatus and method for flow of process gas in an...

Apparatus and method for monitoring processing of a substrate

Apparatus and method for plasma etching

Apparatus and method for radio frequency de-coupling and...

Apparatus and method for reactive atom plasma processing for...

Apparatus and method for reactive atom plasma processing for...