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Magnetron sputtering method and apparatus utilizing a pulsed ene

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering method and sputtering target

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering source and method of use thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering source and method of use thereof

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering source for low pressure operation

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering system and photomask blank production...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering systems including anodic gas...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron sputtering target for reduced contamination

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron with controlled DC power

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron with cooling system for substrate processing system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetron with flux switching cathode and method of operation

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacture method of high coercivity FePt-Si3N4 granular...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacturing method and apparatus of phase shift mask blank

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacturing method and apparatus of phase shift mask blank

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacturing method of magnetoresistive element and film...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacturing method of samarium sulfide thin films

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Manufacturing process for a magneto-resistive head...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Mask and method for making gradient sputtered coatings

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Mask assembly having mask stress relieving feature

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Mask blank manufacturing method and sputtering target for...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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