Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-01-06
2010-11-16
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S192150, C204S298120, C204S298130, C204S298200
Reexamination Certificate
active
07833387
ABSTRACT:
A sputtering target for manufacturing a mask blank having a backing plate5where a portion for bonding a target member4is protruded like the convex with respect to a base portion5′, and the target member4being formed to have a larger surface area than the area of the bonding portion of the backing plate5with extending from the bonding portion over a whole periphery with a bonding agent30interposed in-between, and further a metal40is deposited to a concave portion formed by a combination of the two structures in such a manner that the elution of the bonding agent30can be sealed.
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Mitsui Masaru
Suzuki Toshiyuki
Hoya Corporation
McDonald Rodney G
Sughrue & Mion, PLLC
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