Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-06-07
1991-01-29
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20429811, 20429829, 118504, 118505, 427282, C23C 1434
Patent
active
049884247
ABSTRACT:
Sputtered coatings of gradient thicknesses are produced by employing a foraminous mask between the cathode and the substrate. The size of openings in the foraminous mask may be varied in different areas to provide versatility in controlling the gradient patterns. The invention is particularly suitable for producing gradient electroconductive heating films on transparencies.
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Handbook of Thin Film Technology, Maissel et al., (McGraw-Hill, New York, 1970) pp. 4-13 to 4-20.
Thrasher Chester
Woodward Danny L.
Millman Dennis G.
PPG Industries Inc.
Weisstuch Aaron
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