Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-01-18
1981-12-01
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
B01D 1302
Patent
active
043034934
ABSTRACT:
A sealing frame for alternately arranged anion and cation exchanger membranes of a membrane stack for electrodialysis. The frame edges surround a chamber provided with a net-like spacer placed or inserted therein, and have oppositely located continuous supply and connection bores passing therethrough for the solution to be treated and for the solution enriched with or depleted of separated dissolved electrolyte or electrically non-charged dissolved materials. These bores alternately communicate by means of supply or discharge troughs or channels with the interior of the chamber. The supply and discharge troughs or channels diverge to such an extent in a direction toward the chamber interior that the flow media are distributed in essence over the complete width of the flow path between the cooperating supply and discharge troughs or channels. Furthermore, the net-like spacers extend as far as into the diverging regions of the supply and discharge troughs or channels.
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Hilgendorff Walther
Kneifel Klemens
Martens Uwe
GKSS-Forschungszentrum Geesthacht GmbH
Valentine Donald R.
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