Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-01-17
2009-12-01
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298120, C204S298190
Reexamination Certificate
active
07625471
ABSTRACT:
A sputtering cathode assembly attachable to a cathode mounting plate for a thin-film vapor deposition chamber. The cathode assembly includes a magnet module and a cathode body generally coextensive with and sealingly housing the magnet module and defining a water channel between a top plate of the cathode body and a cooling channel plate of the magnet module. An elongated target is releasably connected atop and coextensive with the top plate and secured in place by a unique threaded fastener engagement between a target clamp and an edge portion of the cathode body whereby the target is replaceable without disassembly of the cathode body. Unique replaceable elongated fastener receiving inserts releasably secure said target against the target plate to effect target replacement without disassembly of the cathode body.
REFERENCES:
patent: 7087145 (2006-08-01), Choquette et al.
Choquette Robert
Manley Patrick
Corsaro & Associates, Co., LPA
Long Clare Smith
McDonald Rodney G
Mustang Vacuum Systems, LLC
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