Semiconductor fabrication apparatus having improved sputtering c

Details Semiconductor fabrication apparatus having improved sputtering c Semiconductor fabrication apparatus having improved sputtering c

1997-01-17

1998-06-23

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, 20419212, C23C 1434

Patent

active

057700265

ABSTRACT:
A semiconductor fabrication apparatus which includes a collimator made of a net type heating material which generates Joule heating when electric power is supplied thereto. The apparatus includes a negative electrode having a metallic target, a positive electrode arranged opposite the negative electrode, on which positive electrode a semiconductor substrate is mounted, and the collimator being mounted between the negative electrode and the positive electrode and near the semiconductor substrate, with the collimator being made of a net type heating material and designed so that Joule heating is generated therein when a current is applied thereto.

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