Sealing apparatus for a vacuum processing system

Details Sealing apparatus for a vacuum processing system Sealing apparatus for a vacuum processing system

1988-10-31

1990-05-08

Bueker, Richard

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118719, 118733, 20419212, 20429826, 20429835, 414217, 414225, C23C 1600

Patent

active

049235842

ABSTRACT:
A sealing arrangement for a vacuum processing system for semiconductor wafers which is effective to apply a sealing force to a valve element (66) between chambers of the processing system. The valve element is defined by a platen which holds wafers (30) for transfer between a horizontal receiving position within a staging chamber (14) to a vertical position within a processing chamber (16-19). The sealing arrangement includes a pair of toggle mechanisms (268) which are manually operable from outside the staging chamber and which, in conjunction with the closing force applied by the platen operating mechanism (165) are effective to maintain vacuum integrity within the staging chamber when the process chamber is at atmospheric pressure or removed for servicing.

REFERENCES:
patent: 4338883 (1982-07-01), Mahler
patent: 4670126 (1987-06-01), Messer et al.
patent: 4857160 (1989-08-01), Landau et al.

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