Rectangular target plate for cathode sputtering apparatus

Details Rectangular target plate for cathode sputtering apparatus Rectangular target plate for cathode sputtering apparatus

1983-03-15

1983-12-20

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044216289

ABSTRACT:
A rectangular target plate for cathode sputtering apparatus has a groove which extends on the side of the surface to be sputtered, along a center line, and in the bottom of which recesses 5 are provided. By means of a thrust strip 6 inserted into the groove, the target plate can be secured to a cooled support, to obtain a satisfactory thermal contact. The depth of the groove is to ensure that the thrust strip does not protrude from the sputtering plane.

REFERENCES:
patent: 4200510 (1980-04-01), O'Connell

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